INVESTIGATING THE OPTICAL CHARACTERISTICS OF NICKEL OXIDE THIN FILMS

Authors

  • Morka, J.C. Department of Physics, University of Delta, Agbor, Delta State
  • Okafor C. Department of Physics, Federal College of Education (Tech),  Asaba, Delta State
  • Okafor, M. C. Department of Physics, Federal College of Education (Tech),  Asaba, Delta State

Keywords:

Optical Characteristics, Nickel Oxide, Thin Films.

Abstract

The optical characteristics of Nickel Oxide (NiO) thin films deposited on glass substrates via chemical bath deposition at room temperature were systematically investigated. The absorbance spectra of the films were recorded using shimadzu UV – 2030 UV-Vis spectrophotometer with high sensitivity photomultiplier tube (PMT) detector, spanning wavelength range of 300 – 1100 nm. The results showed that the films exhibited high transparency with an average transmittance of approximately 80%. The optical absorption study revealed that NiO thin film has a bandgap range of 3.5 eV- 3.8 eV and a refractive index of 1.5. Notably the reflectance of the deposited films was observed to be low across the entire measured spectrum.

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Published

2024-12-10

How to Cite

Morka, J., Okafor, C., & Okafor, M. C. (2024). INVESTIGATING THE OPTICAL CHARACTERISTICS OF NICKEL OXIDE THIN FILMS. International Journal of Novel Research in Science, Technology and Engineering, 7(2). Retrieved from http://publications.oasisinternationaljournal.org/index.php/ijnrste/article/view/78

Issue

Vol. 7 No. 2: International Journal of Novel Research in Science, Technology and Engineering

Section

Articles

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Copyright (c) 2024 International Journal of Novel Research in Science, Technology and Engineering

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